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...ous combination is particularly promising. We propose to merge the unique potential of atmospheric pressure atomic layer deposition (AP-ALD), with nucleation and growth chemical vapour deposition (AP-CVD) with atmospheric pressure based plasma technologies e.g. for surface nano-structuring by growth control or chemical etching and, sub-nanoscale nucleation (seed) layers. The potential for cost ad ...
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 FINISHED 
In recent years, the effort in thin-film silicon (TFSi) was made at solving industrialization issues. In 2010, several companies demonstrated 10% stable modules (> 1 m²). The major “bricks” for efficient production are now in place. Next challenges are linked to the fact that TFSi multi-junction devices, allowing for higher efficiency, are complex devices, in which the substrate geometry and each ...
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Outstanding progress has been made in recent years in developing novel structures and applications for direct fabrication of 3D nanosurfaces. However, exploitation is limited by lack of suitable manufacturing technologies. In this project we will develop innovative in-line high throughput technologies based on atmospheric pressure surface and plasma technologies. The two identified approaches to d ...
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